专利名称：Systems and Methods for Depositing and
Charging Solar Cell Layers
发明人：Jeong-Mo Hwang申请号：US13954099申请日：20130730
公开号：US20140057386A1公开日：20140227
专利附图：
摘要：Systems and methods of the present invention may be used to charge a layer(such as a passivation layer and/or antireflective layer) of a solar cell (e.g., wafer) with apositive or negative charge. The layer may retain the charge to improve operation of the
solar cell. The charged layer may include any suitable dielectric material capable ofretaining either a negative or a positive charge. Systems and methods of the presentinvention permit in-situ charging of a layer. Charging of a layer may be accomplishedduring or after deposition of the layer including after completing the whole solar cellprocess, in other words, on a finished cell.
申请人：Amtech Systems, Inc.
地址：Tempe AZ US
国籍：US
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